RF and DC magnetron sputtering | Abstract
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RF & DC magnetron sputtering

Author(s): Kristen Gray

The gadget comprises of two copper chambers with 1.5 cm and 5 cm in sweep and 20 cm long. An attractive loop mounted around the external chamber produces a hub attractive field up to 550 G. The impact of various attractive fields on the ionization pace of the release is noticed. It is shown that the electrical conduct of the release emphatically relies upon the upsides of the attractive field and shows an ideal worth at which the force consumed by the plasma is greatest. The impact of various tensions on the ionization rate is likewise examined and the outcomes are accoun